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Acoustical force nanolithography of thin polymer films

Physica Status Solidi a-Applications and Materials Science 203(6): 1481-1486

Autoren/Herausgeber: Rubio-Sierra FJ
Yurtsever A
Hennemeyer M
Heckl WM
Stark RW
Erschienen: 2006

Nanomachining of thin polymer resist films with an atomic force microscope (AFM) is a promising route for the fabrication of nanoscale devices. In order to enhance the controllability of the nanomachining process an in-plane acoustic wave is coupled to the sample support. This enhances the intermittent force exerted by the AFM tip. The lateral resolution reached by this method is only limited by the physical size of the AFM tip to dimensions far below the light diffraction limit. The main process parameters are the frequency and magnitude of the acoustic wave, and the preloading force. In this work, the feasibility of acoustical force lithography and the influence of the relevant parameters are investigated. (c) 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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