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Crystalline Pr2O3 monolayers on Si(111)

Applied Physics Letters 90(6): 062906

Autoren/Herausgeber: Jeutter NM
Moritz W
Sidorenko A
Stierle A
Erschienen: 2007
In this study the authors present an x-ray analysis of the structure and of the interface of 1 ML Pr2O3 on Si(111). The x-ray analysis shows that the interface is formed of a Si-O-Pr bond with Pr above the T4 adsorption site of silicon (111). The layer exhibits a thickness of 0.6 nm corresponding to one bulk unit cell from the hexagonal phase of Pr2O3. The layer is well ordered with Pr-O bond lengths close to the bulk values and a Si-O distance of 0.18 nm. (c) 2007 American Institute of Physics.

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